Conformal coatings inside the nanopores of Anodic Aluminum Oxide are used to modify pore geometry, change surface chemistry and impart additional functionality in AAO wafers, membranes and nanotemplates. These coatings are created using Atomic Layer Deposition, a process that offers unmatched control of both the thickness and the composition of the coating, while enabling uniform coating of inside high aspect ratio nanopores of AAO and other high surface area materials. AAO-ALD Nanocomposites in different form factors (wafers, membranes, and nanotemplates) offer expanded opportunities in nanofabrication, micro- and nano-filtration, chemical and biological sensing, life science, energy storage, energy conversion and many other areas.
- InRedox offers AAO-ALD wafers and AAO-ALD films with conformal coatings of Aluminum Oxide, Zinc Oxide and Titanium Oxide.
- Additional materials deposited by ALD include Ta2O5, HfO2, MgO, Y2O3, WN, SiO2, SnO2 and ZrO2, as well as Pt and Ru and certain polymers. For custom AAO-ALD nanocomposites, contact us with your requirements.
|ALD Material||Aluminum Oxide (Al2O3)||Zinc Oxide (ZnO)||Titanium Oxide (TiO2)|
|Properties||insulating and barrier layers, precision reduction of pore diameter and porosity, sealing the pores||conductive and piezoelectric layers, AAO resistance modification, charge dissipation, contacts to nanotubes and nanowires||excellent chemical resistance, photochemical and photocatalytic properties, biocompatibile|
|Applications||filtration and separation, nanofabrication, cell culturing||energy storage (coaxial nanowire ultra-capacitors), energy conversion (photovoltaics), chemical sensing||energy conversion, photocatalysis, photoelectrochemistry, cell culturing|